Surface roughness development during photoresist dissolution

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 4, 1999, Pages 1371-1379

  Flanagin, Lewis W ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 24644502374     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590763     Document Type: Article

References (22)

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