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Volumn 5376, Issue PART 2, 2004, Pages 1131-1137

PEB sensitivity studies of ArF resists (II): Polymer and solvent effects

Author keywords

193 nm resists; ClogP; Hydrophobicity; PEB sensitivity; Polymer; Solvent

Indexed keywords

DIFFUSION; HYDROPHOBICITY; LITHOGRAPHY; MOLECULAR STRUCTURE; OPTIMIZATION; ORGANIC POLYMERS; PARAMETER ESTIMATION; SOLVENTS;

EID: 3843057853     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537931     Document Type: Conference Paper
Times cited : (11)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.