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Volumn 5376, Issue PART 2, 2004, Pages 1131-1137
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PEB sensitivity studies of ArF resists (II): Polymer and solvent effects
a a a a a a a a a a a |
Author keywords
193 nm resists; ClogP; Hydrophobicity; PEB sensitivity; Polymer; Solvent
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Indexed keywords
DIFFUSION;
HYDROPHOBICITY;
LITHOGRAPHY;
MOLECULAR STRUCTURE;
OPTIMIZATION;
ORGANIC POLYMERS;
PARAMETER ESTIMATION;
SOLVENTS;
193NM RESISTS;
CLOGP;
POLYMER;
POST EXPOSURE BAKE (PEB) SENSITIVITY;
PHOTORESISTS;
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EID: 3843057853
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.537931 Document Type: Conference Paper |
Times cited : (11)
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References (15)
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