Optical emission spectra and ion energy distribution functions in TiN deposition process by reactive pulsed magnetron sputtering

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 835-840

  Kim, Yong M ^a   Chung, Yun M ^a   Jung, Min J ^a   Vlcek J ^b   Musil, J ^b   Han, Jeon G ^a  

^a Sungkyunkwan University   (South Korea)

^b UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

Ion energy distribution function (IEDF); Magnetron sputtering; OES; Pulsed plasma; TiN deposition

Indexed keywords

ATOMIC FORCE MICROSCOPY; EMISSION SPECTROSCOPY; MAGNETRON SPUTTERING; MASS SPECTROMETRY; MORPHOLOGY; PLASMAS; SPUTTER DEPOSITION; SURFACES; SYNTHESIS (CHEMICAL); THIN FILMS;

ION ENERGY DISTRIBUTION FUNCTION (IEDF); OPTICAL EMISSION SPECTROSCOPY (OES); PULSED PLASMA;

TITANIUM NITRIDE;

SPUTTERING;

EID: 24644484102     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.02.215     Document Type: Article

References (20)

1. S. Schiller K. Goedicke V. Kirchhoff S. Schneider F. Milde Surf. Coat. Technol. 61 1993 331
2. W.D. Sproul M.E. Graham M.S. Wong S. Lopez D. Li R.A. Scholl J. Vac. Sci. Technol., A, Vac. Surf. Films 13 1995 1188
3. R.A. Scholl Surf. Coat. Technol. 98 1998 823
4. J. Sellers Surf. Coat. Technol. 98 1998 1245
5. P.J. Kelly R.D. Arnell J. Vac. Sci. Technol., A, Vac. Surf. Films 17 1999 945
6. A. Belkind A. Freilich R.A. Scholl J. Vac. Sci. Technol., A, Vac. Surf. Films 17 1999 1934
7. J. Loureirot A. Ricard J. Phys. D: Appl. Phys. 26 1993 163
8. F. Debal M. Wautelet J. Bretagne J.P. Dauchot M. Hecq Plasma Sources Sci. Technol. 9 2000 152
9. J. Brasley H. Bäcker Y. Aranda-Gonzalvo P. Kelly R. Arnel Plasma Sources Sci. Technol. 11 2002 165
10. E. Edelberg A. Perry N. Benjamin E. Aydil Rev. Sci. Instrum. 70 1999 2689
11. A. Raveh M. Weiss R. Shneck Surf. Coat. Technol. 111 1999 263
12. S. Peter U.F. Richtera R. Tabersky U. König Thin Solid Films 377-379 2001 430
13. H. Kajioka Vacuum 48 1997 893
14. P.J. Kelly R. Hall J. O'Brien J.W. Bradley G. Roche R.D. Arnell Surf. Coat. Technol. 142-144 2001 635
15. J. Bradly H. Bäcker Y. Aranda-Gonzalvo P.J. Kelly R.D. Arnell Plasma Sources Sci. Technol. 11 2002 165
16. R. Snydera R. Couttebaron J.P. Dauchat M. Hecq J. Anal. At. Spectrom. 18 2003 18
17. S.K. Karkari H. Bäcker D. Foeder J.W. Bradley Meas. Sci. Technol. 13 2002 1431
18. J.J. Cuomo S.M. Rossnagel Handbook of Ion Beam Processing Technology 1989 Noyes Publications Park Ridge, NJ
19. C. Gautier G. Moulard J.P. Chatelon G. Motyl Thin Solid Films 382 2001 102
20. E.V. Barnat T.-M. Lu J. Appl. Phys. 92 6 2002 2984