Ion beam studies of high-k ultrathin films deposited on Si

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 190, Issue 1-4, 2002, Pages 510-513

  Pezzi, R P ^a   Krug, C ^a   Da Rosa, E B O ^a   Morais, J ^a   Miotti, L ^a   Baumvol, I J R ^a  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

High k materials; ISS; NRP; RBS

Indexed keywords

ANNEALING; INTERFACES (MATERIALS); ION BEAMS; MICROELECTRONICS; SCATTERING; SEMICONDUCTING SILICON;

NUCLEAR RESONANCE;

ULTRATHIN FILMS;

EID: 0036569068     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)00449-4     Document Type: Conference Paper

References (13)