Atomic layer deposition of hafnium and zirconium silicate thin films

Computational Materials Science

Volumn 27, Issue 1-2, 2003, Pages 65-69

  Vainonen Ahlgren, E ^a   Tois, E ^a   Ahlgren, T ^b   Khriachtchev, L ^b   Marles, J ^a   Haukka, S ^a   Tuominen, M ^a  

^a ASM Microchemistry Oy   (Finland)

^b UNIVERSITY OF HELSINKI   (Finland)

Author keywords

ALCVD technique; High k materials; Photoluminescence; Silicates

Indexed keywords

COATING TECHNIQUES; ELLIPSOMETRY; HAFNIUM COMPOUNDS; LAYERED MANUFACTURING; PHOTOLUMINESCENCE; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; ZIRCONIUM COMPOUNDS;

ATOMIC LAYER DEPOSITION (ALD);

THIN FILMS;

EID: 0037373190     PISSN: 09270256     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0256(02)00426-3     Document Type: Conference Paper

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