A-C:H/a-C:H(N) thin film deposition using 2.45 GHz expanding surface wave sustained plasmas

Plasma Sources Science and Technology

Volumn 14, Issue 3, 2005, Pages 451-458

  Hong, Suk Ho ^a   Douai, David ^a   Berndt, Johannes ^a   Winter, Jörg ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARBON; HYDROGEN; PLASMAS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; SURFACE WAVES;

CARBON DENSITY; GAS MIXTURE; OPTICAL CONSTANT; THIN FILM PROPERTIES;

THIN FILMS;

EID: 23844513038     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/14/3/006     Document Type: Article

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