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Thin Solid Films

Volumn 338, Issue 1-2, 1999, Pages 88-92

Effect of the substrate temperature on the deposition of hydrogenated amorphous carbon by PACVD at 35 kHz

(7) Gago, R a Sanchez Garrido O a Climent Font, A b Albella, J M a Roman E a Raisanen, J c Rauhala E c

a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID (Spain)

b UNIVERSIDAD AUTÓNOMA DE MADRID (Spain)

c UNIVERSITY OF HELSINKI (Finland)

Author keywords

Carbon; Chemical vapour deposition; Plasma processing and deposition; Structural properties

Indexed keywords

AMORPHOUS MATERIALS; AUGER ELECTRON SPECTROSCOPY; CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRIC VARIABLES MEASUREMENT; ELECTRON ENERGY LOSS SPECTROSCOPY; ELLIPSOMETRY; HYDROGEN; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; THERMAL EFFECTS;

ELASTIC RECOIL DETECTION ANALYSIS (ERDA); PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION (PACVD);

AMORPHOUS FILMS;

EID: 0032741531 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)01002-5 Document Type: Article

Times cited : (31)

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