Modification of diamond film growth by a negative bias voltage in microwave plasma chemical vapor deposition

Diamond and Related Materials

Volumn 7, Issue 2-5, 1998, Pages 293-298

  Schreck, M ^a   Baur, T ^a   Fehling, R ^a   Muller M ^a   Stritzker, B ^a   Bergmaier, A ^b   Dollinger, G ^b  

^a UNIVERSITY OF AUGSBURG   (Germany)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

Bias; Elastic recoil detection; Growth; Stress

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GROWTH (MATERIALS); MICROWAVES; PLASMAS; STRESSES;

ELASTIC RECOIL DETECTION;

DIAMOND FILMS;

EID: 0031996350     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(97)00260-4     Document Type: Article

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