Effects of applied bias voltage on the properties of a-C : H films

Surface and Coatings Technology

Volumn 78, Issue 1-3, 1996, Pages 31-36

  Yin, Dachuan ^a   Xu, Niankan ^a   Liu, Zhengtang ^a   Han, Yong ^a   Zheng, Xiulin ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

A C:H films; Applied bias; d.c. r.f. PECVD

Indexed keywords

ADHESION; CARBON; CHEMICAL VAPOR DEPOSITION; EFFECTS; HARDNESS; HYDROGEN; PLASMA APPLICATIONS; REFRACTIVE INDEX; STRESSES;

INTERNAL STRESS; ION BEAM DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SELF BIAS VOLTAGE EFFECTS; VICKERS MICROHARDNESS;

AMORPHOUS FILMS;

EID: 0011408830     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(94)02387-5     Document Type: Article

References (19)

1. R.S. Yalamanchi and G.K.M. Thutupall, Thin Solid Films, 164 (1988) 103.
2. L.H. Chou, J. Appl. Phys., 72 (1992) 2027.
3. Y. Catherine, Mater. Sci. Forum, 52-53 (1989) 175.
4. S. Jayshree, P. Raghunath, B. Suryadevara and D. Mosses, Thin Solid Films, 212 (1992) 251.
5. R.L.C. Wu, Surf. Coat. Technol., 51 (1992) 258.
6. G.F. Ivanovsky, V.V. Sleptsov, V.M. Elinson, A.M. Baranov, A.A. Kuzin and P.E. Kondrashov, Surf. Coat. Technol., 48 (1991) 189.
7. M. Rubin, C.B. Hopper and N.-H. Cho, J. Mater. Res., 5 (1990) 2538.
8. J. Robertson, Surf. Coat. Technol., 50 (1992) 185.
9. L.J. Guo, G.F. Zhang, Z.T. Liu, N.K. Xu and X.L. Zheng, J. Northwestern Polytech. Univ., 10 (1992) 565.
10. P.X. Li, Biao Mian Gong Cheng, Shanghai Jiaotong University Press, Shanghai, 1989, p. 60.
11. W.A. Brantley, J. Appl. Phys., 44 (1973) 534.
12. J.W. Zou, K. Schmidt, K. Reichlt and B. Dishler, J. Appl. Phys., 67 (1990) 487.
13. P. Koidl, C. Wild, B. Dishler, J. Wagner and M. Ramsteiner, Mater. Sci. Forum, 52 (1990) 41.
14. M.A. Tamor, W.C. Vassell and K.R. Carduner, Appl. Phys. Lett., 58 (1991) 592.
15. C. Serra, E. Pascual, F. Maass and J. Esteve, Surf. Coat. Technol., 47 (1991) 89.
16. D.R. McKenzie, D.A. Muller, E. Kravtchinskaia, D. Segal and D.J.H. Cockayne, Thin Solid Films, 206 (1991) 198.
17. X. Jiang, K. Reichelt and B. Stritzer, J. Appl. Phys., 66 (1989) 5805.
18. W. Moller, Appl. Phys. A, 56 (1993) 527.
19. J.L. Vossen and W. Kern, Thin Film Processes, Academic Press, New York, 1978, p. 56.