Spatially resolved plasma diagnostic in an expanding microwave discharge containing an Ar-CH4 gas mixture: uniformity and stability of the discharge

Journal of Physics D: Applied Physics

Volumn 32, Issue 4, 1999, Pages 445-455

  Jauberteau, J L ^a   Cinelli, M J ^a   Jauberteau, I ^a   Aubreton, J ^a  

^a UNIVERSITY OF LIMOGES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARRIER CONCENTRATION; DISCHARGE (FLUID MECHANICS); ELECTRON ENERGY LEVELS; ELECTROSTATICS; KINETIC ENERGY; MAXWELL EQUATIONS; METHANE; MICROWAVES; PLASMA STABILITY; POTENTIAL ENERGY; WAVE PROPAGATION; ELECTROMAGNETIC WAVE ABSORPTION; FUNCTIONS; MIXTURES;

ELECTRON ENERGY DISTRIBUTION FUNCTION; ELECTROSTATIC PROBES; MAXWELL DISTRIBUTION FUNCTION; MICROWAVE EXPANSION; STOCHASTIC ELECTRON HEATING; ELECTRON ENERGY DISTRIBUTION FUNCTION (EEDF); EXPANDING MICROWAVE DISCHARGES;

PLASMAS; PLASMA DIAGNOSTICS;

EID: 0033068271     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/32/4/015     Document Type: Article

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