Screening phenomena on oxide surfaces and its implications for local electrostatic and transport measurements

Nano Letters

Volumn 4, Issue 4, 2004, Pages 555-560

  Kalinin, Sergei V ^a   Bonnell, Dawn A ^b  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF PENNSYLVANIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOTUBE; OXIDE;

ADSORPTION; ANALYTIC METHOD; ARTICLE; ELECTRIC ACTIVITY; ELECTRICITY; ELECTRON TRANSPORT; MEASUREMENT; NANOTUBE; SCANNING PROBE MICROSCOPY; SCREENING; TEMPERATURE;

EID: 2342459607     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl0350837     Document Type: Article

References (27)

1. Bridger, P. M.; Bandic, Z. Z.; Piquette, E. C.; McGill, T. C. Appl. Phys. Lett. 1999, 74, 3522.
2. Xu, Q.; Hsu, J. W. P. J. Appl. Phys. 1999, 85, 2465.
3. Chen, X. Q.; Yamada, H.; Horiuchi, T.; Matsushige, K.; Watanabe, S.; Kawai, M.; Weiss, P. S. J. Vac. Sci. Technol., B 1999, 77, 1930.
4. Tybell, T.; Ahn, C. H.; Triscone, J.-M. Appl. Phys. Lett. 1999, 75, 856.
5. Chavez-Pirson, A.; Vatel, O.; Tanimoto, M.; Ando, H.; Iwamura, H.; Kanbe, H. Appl. Phys. Lett. 1995, 67, 3069.
6. Meoded, T.; Shikler, R.; Fried, N.; Rosenwaks, Y. Appl. Phys. Lett. 1999, 75, 2435.
7. Kalinin, S. V.; Bonnell, D. A. Z. Metallkd. 1999, 90, 983.
8. Luo, E. Z.; Xie, Z.; Xu, J. B.; Wilson, I. H.; Zhao, L. H. Phys. Rev. B 2000, 61, 203.
9. Tanimoto, M.; Vatel, O. J. Vac. Sci. Technol., B 1996, 14, 1547.
10. Scanning Probe Microscopy and Spectroscopy: Theory, Techniques and Applications; Bonnell, D. A., Ed.; John Wiley: New York, 2000.
11. Dagata, J. A.; Schneir, J.; Harary, H. H.; Evans, C. J.; Postek, M. T.; Bennett, J. Appl. Phys. Lett. 1990, 56, 2001.
12. Garcia, R.; Calleja, M.; Perez-Murano, F. Appl. Phys. Lett. 1998, 72, 2295.
13. Domansky, K.; Leng, Y.; Williams, C. C.; Janata, J.; Petelenz, D. Appl. Phys. Lett. 1993, 63, 1513.
14. Sugimura, H.; Ishida, Y.; Hayashi, K.; Takai, O.; Nakagiri, N. Appl. Phys. Lett. 2002, 80, 1459.
15. Terris, B. D.; Stern, J. E.; Rugar, D.; Mamin, H. J. Phys. Rev. Lett. 1989, 63, 2669.
16. Cunningham, S.; Larkin, I. A.; Davies, J. H. Appl. Phys. Lett. 1998, 73, 123.
17. Buh, G. H.; Chung, H. J.; Kuk, Y. Appl. Phys. Lett. 2001, 79, 2010.
18. 3 crystal, which is dark blue because of donor doping, is sectioned such that the grain boundary is perpendicular to the (100) surface.
19. The AFM, EFM, and SSPM measurements were performed on a commercial instrument (Digital Instruments Dimension 3000 NS-IIIA) using a variety of probes. The lift height for the interleave scans was usually 100 nm. Measurements were performed using Au-coated cantilevers (spring constant k = 1-5 N/m, NCSC 12 Cr-Au, Micromasch). The scan rate varied from 0.5 Hz for large scans (∼80 μm) to 1 Hz for smaller scans (∼10 μm). The driving voltage Vac in the interleave scan was 5 V. The scan rate varied from 0.2 to 0.5 Hz. To reduce the effect of drift, the images were acquired with the grain boundary oriented along the slow scan axis. SSPM and EFM images were processed only by a background subtraction.
20. Kalinin, S. V.; Bonnell, D. A. Phys. Rev. B 2000, 62, 10419.
21. Kalinin, S. V.; Duscher, G.; Bonnell, D. A. To be submitted for publication.
22. Kalinin, S. V.; Bonnell, D. A. Phys. Rev. B 2001, 63, 125411.
23. Kalinin, S. V.; Johnson, C. Y.; Bonnell, D. A. J. Appl. Phys. 2002, 91, 3816.
24. Zeng, H. R.; Yin, Q. R.; Li, G. R.; Luo, H. S.; Xu, Z. K. J. Cryst. Growth 2003, 254, 432.
25. Kim, W.; Javey, A.; Vermesh, O.; Wang, Q.; Li, Y.; Dai, H. Nano Lett. 2003, 3, 193.
26. Bachtold, A.; Fuhrer, M. S.; Plyasunov, S.; Forero, M.; Anderson, E. H.; Zettl, A.; McEuen, P. L. Phys. Rev. Lett. 2000, 84, 6082.
27. Sergei Kalinin, V.; Dawn Bonnell, A. Appl. Phys. Lett. 2001, 78, 1306.