Kelvin probe force microscopy for characterization of semiconductor devices and processes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 2, 1996, Pages 1547-1551

  Tanimoto, Masafumi ^a   Vatel, Olivier ^a,b  

^a NTT CORPORATION   (Japan)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5544224805     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589136     Document Type: Article

References (16)

1. P. Muralt and D. W. Pohl, Appl. Phys. Lett. 48, 514 (1986).
2. J. P. Pelz and R. H. Kock, Rev. Sci. Instrum. 60, 301 (1989).
3. M. Tanimoto and K. Arai, J. Vac. Sci. Technol. B 12, 2125 (1994).
4. Y. Martin, D. W. Abraham, and H. K. Wickramasinghe, Appl. Phys. Lett. 52, 1103 (1988).
5. M. Nonnenmacher, M. P. O'Boyle, and H. K. Wickramasinghe, Appl. Phys. Lett. 58, 2921 (1991).
6. M. Nonnenmacher, M. P. O'Boyle, and H. K. Wickramasinghe, Ultramicroscopy 42-44, 268 (1992).
7. O. Vatel and M. Tanimoto, J. Appl. Phys. 77, 2358 (1995).
8. T. Takigami and M. Tanimoto, Appl. Phys. Lett. 58, 2288 (1991).
9. M. Barrett, M. Dennis, D. Tiffin, Y. Li, and C. K. Shih, IEEE Electron Device Lett. EDL-16, 118 (1995).
10. S. Hosaka, S. Hosoki, K. Tanaka, K. Horiuchi, and N. Natsuaki, Appl. Phys. Lett. 53, 487 (1988).
11. S. Kordić, E. J. van Loenen, D. Dijkkamp, A. J. Hoeven, and H. K. Moraal, J. Vac. Sci. Technol. A 8, 549 (1990).
12. C. C. Williams, J. Slinkman, and W. K. Wickramasinghe, Appl. Phys. Lett. 55, 1662 (1989).
13. A. K. Henning, T. Hochwitz, J. Slinkman, J. Never, S. Hoffmann, P. Kaszuba, and C. Daghlian, J. Appl. Phys. 77, 1888 (1995).
14. Seiko Instruments: SPI3700/SPA300.
15. M. Shinohara, M. Tanimoto, H. Yokoyama, and N. Inoue, Appl. Phys. Lett. 65, 1418 (1994).
16. H. Yokoyama and T. Inoue, Thin Solid Films 242, 33 (1994).