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Volumn 75, Issue 6, 1999, Pages 856-858

Ferroelectricity in thin perovskite films

Author keywords

[No Author keywords available]

Indexed keywords

FERROELECTRICITY; FILM GROWTH; LEAD COMPOUNDS; MAGNETRON SPUTTERING; MICROSCOPIC EXAMINATION; PEROVSKITE; SINGLE CRYSTALS; SPUTTER DEPOSITION; THIN FILMS;

EID: 0032615031     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124536     Document Type: Article
Times cited : (438)

References (19)
  • 6
  • 13
    • 85034181936 scopus 로고    scopus 로고
    • note
    • Using x-ray finite-size effects, the thickness of the films was directly measured on all films thicker than ∼80 Å, thus checking the reliability of the rate calibration, typically, ± 10%. For the thinnest films we rely on the calibrated deposition rate.
  • 14
    • 85034185137 scopus 로고    scopus 로고
    • note
    • 3 substrate, allowing us to confirm the epitaxy.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.