Real-time evolution of trapped charge in a SiO2 layer: An electrostatic force microscopy study

Applied Physics Letters

Volumn 79, Issue 13, 2001, Pages 2010-2012

  Buh, G H ^a   Chung, H J ^a   Kuk, Y ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035943927     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1404404     Document Type: Article

References (17)

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