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Journal of Photopolymer Science and Technology

Volumn 14, Issue 3, 2001, Pages 457-462

Mold surface treatment for imprint lithography

(8) Hirai, Yoshihiko a Yoshida, Satoshi a Okamoto, Akio b Tanaka, Yoshio a Endo, Masataka c Irie, Sigeo c Nakagawa, Hideo c Sasago, Masaru c

a Osaka Prefecture University (Japan)

b OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE (Japan)

c PANASONIC CORPORATION (Japan)

Author keywords

Adhesion; Contact angle; Imprint lithography; Mold; Surface treatment

Indexed keywords

FLUORINE; POLYMER;

ADHESION; ARTICLE; ATMOSPHERE; LITHOGRAPHY; MOULD; QUANTITATIVE ANALYSIS; SURFACE PROPERTY; SURFACE TENSION; TECHNOLOGY;

EID: 0035751216 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.14.457 Document Type: Article

Times cited : (102)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.