Infrared spectroscopy study of low-dielectric-constant fluorine-incorporated and carbon-incorporated silicon oxide films

Journal of Applied Physics

Volumn 90, Issue 7, 2001, Pages 3367-3370

  Kim, Yoon Hae ^a   Hwang, Moo Sung ^a   Kim, Hyeong Joon ^a   Kim, Jin Yong ^b   Lee, Young ^c  

^a Seoul National University   (South Korea)

^b Seoul National University   (South Korea)

^c Jusung Engineering Company Limited   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035476311     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1402152     Document Type: Article

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