Comparative studies of ultra low-k porous silica films with 2-D hexagonal and disordered pore structures

Materials Research Society Symposium Proceedings

Volumn 812, Issue , 2004, Pages 43-48

  Fujii, Nobutoshi ^a   Yamada, Kazuhiro ^a   Oku, Yoshiaki ^a   Hata, Nobuhiro ^b   Seino, Yutaka ^b   Negoro, Chie ^b   Kikkawa, Takamaro ^b,c  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CALCINATION; DIELECTRIC MATERIALS; ELASTIC MODULI; ETHANOL; HARDNESS; MICELLES; OLIGOMERS; SURFACE ACTIVE AGENTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; ULSI CIRCUITS; X RAY DIFFRACTION ANALYSIS;

HEXAMETHYLDISILAZANE (HMDS); INTERLAYER DIELECTRICS (ILD); NANOINDENTATION; X-RAY SCATTERING SPECTROSCOPY;

SILICA;

EID: 12844266018     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-812-f4.10     Document Type: Conference Paper

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