Effects of surfactants on the properties of ordered periodic porous silica films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 4 B, 2003, Pages 1840-1842

  Yamada, Kazuhiro ^a   Oku, Yoshiaki ^a   Hata, Nobuhiro ^b   Takada, Syozo ^b   Kikkawa, Takamaro ^b,c  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Dielectric constant; Low k; Periodic pore structure; Porous silica; Refractive index

Indexed keywords

AMMONIUM COMPOUNDS; CRYSTALLINE MATERIALS; MOLECULAR STRUCTURE; PERMITTIVITY; POROSITY; POROUS MATERIALS; REFRACTIVE INDEX; SEMICONDUCTING SILICON; SILANES; SILICA; SPIN COATING; SURFACE ACTIVE AGENTS;

ALKOXYSILANE SOLUTION; ALKYLTRIMETHYLAMMONIUM CHLORIDE; PORE STRUCTURE; POROUS SILICA FILM; TETRAETHYLORTHOSILICATE VAPOR TREATMENT;

DIELECTRIC FILMS;

EID: 0037672210     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

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