Laser micromachining of optical devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5662, Issue , 2004, Pages 515-525

  Kopitkovas, Giedrius ^a   Lippert, Thomas ^a   David, Christian ^a   Sulcas, Rokas ^b   Hobley, Jonathan ^c   Wokaun, Alexander ^a   Gobrecht, Jens ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b EKSPLA LTD   (Lithuania)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRON BEAM LITHOGRAPHY; ETCHING; EVAPORATION; EXCIMER LASERS; MICROLENSES; MICROMACHINING; NEODYMIUM LASERS; PHOTOLITHOGRAPHY; SPECTROMETERS; THERMAL EFFECTS; TRANSPARENCY; ULTRAVIOLET RADIATION;

DAMAGE RESISTANCE; ETCH ROUGHNESS; LASER INDUCED BACKSIDE WET ETCHING (LIBWE); LASER MICROMACHINING;

MICROOPTICS;

EID: 20444382369     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.596387     Document Type: Conference Paper

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