Atomic layer deposition of hexagonal-phase Ta2O5 using TaF5 and H2O

Journal of the Electrochemical Society

Volumn 152, Issue 5, 2005, Pages

  Hill, Chris W ^a   Derderian, Garo J ^a   Sandhu, Gurtej ^a  

^a MICRON TECHNOLOGY INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEGREES OF FREEDOM (MECHANICS); ELLIPSOMETRY; INTERFACES (MATERIALS); ORGANOMETALLICS; TANTALUM COMPOUNDS; THIN FILMS; WATER; X RAY DIFFRACTION;

ATOMIC LAYER DEPOSITION; CRYSTALLINE PHASES; GROWTH RATE; HYDROXYL SPECIES;

DEPOSITION;

EID: 20344398424     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1890726     Document Type: Article

References (23)

1. M. Hiratani, S. Kimura, T. Hamada, S. Lijima, and N. Nakanishi, Appl. Phys. Lett., 81, 2433 (2002).
2. C. Chaneliere, S. Four, J. L. Autran, and R. A. Devine, Electrochem. Solid-State Lett., 2, 291 (1999).
3. C. Chaneliere, J. L. Autran, R. A. Devine, and B. Balland, Mater. Sci. Eng., R., 22, 269 (1998).
4. D. M. Hausmann, P. de Rouffignac, A. Smith, R. Gordon, and D. Monsma, Thin Solid Films, 443, 1 (2003).
5. H. Song, C. Lee, and S. Kang, Electrochem. Solid-State Lett., 4, F13 (2001).
6. H. Song, W. Koh, and S. Kang, Mater. Res. Soc. Symp. Proc., 567, 469 (1999).
7. B. K. Moon, C. Isobe, and J. Aoyama, J. Appl. Phys., 85, 1731 (1999).
8. C. Chaneliere, S. Four, J. L. Autran, R. A. Devine, and N. P. Sandler, J. Appl. Phys., 83, 4823 (1998).
9. K. Kukli, M. Ritala, R. Matero, and M. Leskelä, J. Cryst. Growth, 212, 459 (2000).
10. K. Kukli, J. Aarik, A. Aidla, O. Kohan, T. Uustare, and V. Sammelselg, Thin Solid Films, 260, 135 (1995).
11. K. Kukli, J. Aarik, A. Aidla, K. Forsgren, J. Sundqvist, A. Hårsta, T. Uustare, H. Mändar, and A. Kiisler, Chem. Mater., 13, 122 (2001).
12. S. Four, R. A. Devine, E. Z. Luo, I. H. Wilson, and H. S. Cheng, J. Non-Cryst. Solids, 254, 139 (1999).
13. J. Lim, H. Park, and S. Kang, J. Electrochem. Soc., 148, C403 (2001).
14. M. A. Alam and M. L. Green, J. Appl. Phys., 94, 3403 (2003).
15. S. Haukka and T. Suntola, Interface Sci., 5, 119 (1997).
16. ASTM X-ray Powder Data Card, No. 18-1,304.
17. T. Suntola, Mater. Sci. Rep., 4, 261 (1989).
18. R. Kuse, M. Kundu, T. Yasuda, N. Miyata, and A. Toriumi, J. Appl. Phys., 94, 6411 (2003).
19. M. Ylilammi, Thin Solid Films, 279, 124 (1996).
20. F. R. McFeely, L. J. Terminello, and S. P. Kowalczyk, Appl. Phys. Lett., 57, 667 (1990).
21. A. W. Adamson, Physical Chemistry of Surfaces, 4th ed., Wiley Interscience, New York (1982).
22. Handbook of Chemistry and Physics, 72nd ed., D. R. Lide, Editor, CRC Press, Boca Raton, FL (1991).
23. Y. Widjaja and C. B. Musgrave, Appl. Phys. Lett., 80, 3304 (2002).