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Volumn 5, Issue 2-3, 1997, Pages 119-128

Advanced Materials Processing by Adsorption Control

Author keywords

Atomic layer epitaxy (ale); Atomic layer level; Catalyst preparation; Chemisorption; Gas solid reactions; High surface area materials; Saturation

Indexed keywords

ADSORPTION; CATALYSTS; CHEMICAL REACTIONS; CHEMISORPTION; CONTROL; DEPOSITION; SATURATION (MATERIALS COMPOSITION); SURFACE STRUCTURE;

EID: 0031224604     PISSN: 09277056     EISSN: None     Source Type: Journal    
DOI: 10.1023/a:1008601024870     Document Type: Article
Times cited : (58)

References (23)
  • 2
    • 0000300191 scopus 로고
    • Atomic Layer Epitaxy
    • Thin Films and Epitaxy, Growth Mechanisms and Dynamics Elsevier, Chapt. 14
    • T. Suntola, Atomic Layer Epitaxy, Handbook of Crystal Growth 3, Thin Films and Epitaxy, Part B: Growth Mechanisms and Dynamics (Elsevier, 1994), Chapt. 14.
    • (1994) Handbook of Crystal Growth 3 , Issue.PART B
    • Suntola, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.