Electron projection lithography tool development status

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2622-2626

  Miura, Takaharu ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; COMPUTER SIMULATION; CONTROL SYSTEMS; ELECTRON BEAMS; INTEGRATED CIRCUIT MANUFACTURE; INTERFEROMETERS; MASKS; MIRRORS; OPTICAL INSTRUMENT LENSES; PHOTOLITHOGRAPHY; SILICON WAFERS; VACUUM APPLICATIONS;

ELECTRON PROJECTION LITHOGRAPHY; VACUUM BODY SYSTEM; VACUUM LOADER SYSTEM; VACUUM STAGE SYSTEM;

ELECTRON BEAM LITHOGRAPHY;

EID: 0036883137     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1520576     Document Type: Article

References (4)

1. K. Okamoto et al., Solid State Technol. 43, 118 (2000).
2. K. Suzuki et al., Proc. SPIE 3997, 214 (2000).
3. T. Novak et al., Nikon Electron Projection Lithography System: Mechanical and Metrology Issues (American Society of Precision Engineering, 2000).
4. T. Miura, Proceedings of the Fourth International Workshop on High Throughput Charged Particle Lithography, 2001 (unpublished).