High emittance source for the PREVAIL projection lithography system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2856-2859

  Golladay, S D ^a   Kendall, R A ^a   Doran, S K ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033272489     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591083     Document Type: Article

References (7)

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4. BOERSCHT, a program from the BOERSCH software package, Ver. 1.8, from Munro's Electron Beam Software Ltd.
5. M. B. Heritage, J. Vac. Sci. Technol. 12, 1135 (1975).
6. M. Essig and H. Pfeiffer, J. Vac. Sci. Technol. B 4, 83 (1986).
7. 6-04b (1991).