Electron optical image correction subsystem in electron beam projection lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3017-3022

  Kojima, S ^a,b   Stickel, W ^b   Rockrohr, J D ^b   Gordon, M ^b  

^a NIKON CORPORATION   (Japan)

^b IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC SPACE CHARGE; ELECTRON LENSES; ELECTRON OPTICS; ERROR ANALYSIS; IMAGE ANALYSIS;

CURVILINEAR VARIABLE AXIS LENS (CVAL); ELECTRON OPTICAL IMAGE; IMAGE FIDELITY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034314710     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1324641     Document Type: Article

References (4)

1. H. C. Pfeiffer et al., J. Vac. Sci. Technol. B 17, 2840 (1999).
2. X. Zhu, H. Liu, and E. Munro, Proc. SPIE 2522, 66 (1995).
3. W. Stickel and G. O. Langner, J. Vac. Sci. Technol. B 17, 2847 (1999).
4. M. Gordon et al., J. Vac. Sci. Technol. B, these proceedings.