Nikon EB stepper: Its system concept and countermeasures for critical issues

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 214-224

  Suzuki, Kazuaki ^a   Fujiwara, Tomoharu ^a   Hada, Kazunari ^a   Hirayanagi, Noriyuki ^a   Kawata, Shintaro ^a   Morita, Kenji ^a   Okamoto, Kazuya ^a   Okino, Teruaki ^a   Shimizu, Sumito ^a   Yahiro, Takehisa ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON SCATTERING; SEMICONDUCTING SILICON;

ELECTRON PROJECTION LITHOGRAPHY (EPL); PROXIMITY EFFECT CORRECTION; STENCIL RETICLE;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033712165     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)