Nikon EB Stepper: The latest development status

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 80-87

  Suzuki, K ^a   Fujiwara, T ^a   Hada, K ^a   Hirayanagi, N ^a   Kawata, S ^a   Morita, K ^a   Okamoto, K ^a   Okino, T ^a   Shimizu, S ^a   Yahiro, T ^a   Yamamoto, H ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Continuous membrane reticle; Electron Beam (EB); Electron Projection Lithography (EPL); Proximity effect correction; Scattering contrast; Stencil reticle; Stitching

Indexed keywords

BACKSCATTERING; ELECTRON SCATTERING; ERRORS; MASKS; OPTICAL RESOLVING POWER;

ELECTRON PROJECTION LITHOGRAPHY (EPL);

ELECTRON BEAM LITHOGRAPHY;

EID: 17944380468     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436632     Document Type: Conference Paper

References (16)

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8. Experimental evaluation of proximity effect for EPL using the shape correction method
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12. High-accurate CD control at stitching region for electron-beam projection lithography
13. High-accuracy aerial image measurement for electron beam projection lithography
14. Pattern displacement measurements for Si stencil reticles
15. New data post-processing for e-beam projection lithography
16. Electron Optical Image Correction Subsystem in Electron Beam Projection Lithography