Direct measurement of Coulomb effects in electron beam projection lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2468-2473

  Yahiro, Takehisa ^a   Suzuki, Shohei ^a   Irita, Takeshi ^a   Hirayanagi, Noriyuki ^a   Shimizu, Hiroyasu ^a   Kojima, Shinichi ^a   Morita, Kenji ^a   Kawata, Shintaro ^a   Okino, Teruaki ^a   Suzuki, Kazuaki ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON OPTICS; ELECTRONS; MEMBRANES; MONTE CARLO METHODS; SEMICONDUCTING SILICON;

COULOMB EFFECT MEASUREMENT; DEFOCUS; ELECTRON BEAM PROJECTION LITHOGRAPHY; IMAGE BLUR; KNIFE EDGE METHOD; SILICON MEMBRANE;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035519806     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1410089     Document Type: Article

References (12)

1. H. C. Pfeiffer et al., Jpn. J. Appl. Phys., Part 1 34, 6658 (1995).
2. K. Suzuki et al., Proc. SPIE 3997, 214 (2000).
3. S. D. Golladay et al., J. Vac. Sci. Technol. B 18, 3072 (2000).
4. S. Kojima et al., J. Vac. Sci. Technol. B 18, 3017 (2000).
5. M. M. Mkrtchyan et al., J. Appl. Phys. 78, 6888 (1995).
6. W. Stickle, J. Vac. Sci. Technol. B 16, 3211 (1998).
7. K. Saito et al., J. Vac. Sci. Technol. B 15, 2279 (1997).
8. M. M. Mkrtchyan et al., Jpn. J. Appl. Phys., Part 1 39, 6881 (2000).
9. T. Yahiro et al., Proc. SPIE 4343, 483 (2001).
10. K. Morita et al., Proc. SPIE 3997, 703 (2000).
11. T. Yamaguchi et al., Jpn. J. Appl. Phys., Part 1 39, 6897 (2000).
12. Munro's Electron Beam Software, Ltd., London.