Data of scattered electron characteristics in 100 kV EB stepper

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 703-712

  Morita, Kenji ^a   Yahiro, Takehisa ^a   Shimizu, Sumito ^a   Yamamoto, Hajime ^a   Hirayanagi, Noriyuki ^a   Fujiwara, Tomoharu ^a   Suzuki, Shohei ^a   Shimizu, Hiroyasu ^a   Kawata, Shintaro ^a   Okino, Teruaki ^a   Suzuki, Kazuaki ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; ELECTRON OPTICS; ELECTRON SCATTERING; PHOTORESISTS;

ELECTRON BEAM MARK DETECTION; PROXIMITY EFFECT; SCATTERING CONTRAST; SCATTERING STENCIL RETICLE;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033716206     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)