Simulation of Coulomb interactions in electron beam lithography systems - A comparison of theoretical models

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3211-3214

  Stickel, W ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008005748     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590353     Document Type: Review

References (10)

1. SCALPEL ®; see, for example, the website of Lucent Technologies; Chalupka et al., J. Vac. Sci. Technol. B 12, 3513 (1994).
2. Munro's Electron Beam Software Ltd., London, England.
3. Delft Particle Optics Foundation, Delft, The Netherlands.
4. G. H. Jansen, J. Appl. Phys. 84, 4549 (1998).
5. M. M. Mrktchyan et al., J. Appl. Phys. 78, 6888 (1995).
6. A. Weidenhausen, R. Spehr, and H. Rose, Optic 69, 126 (1985).
7. W. Stickel, Proc. SPIE 2522, 340 (1995).
8. M. M. Mrktchyan et al. Proc. SPIE 2522, 351 (1995).
9. H. C. Pfeiffer and W. Stickel, Microelectron. Eng. 27, 143 (1995).
10. G. H. Jansen, Advances in Electronics and Electron Physics (Academic, New York, 1990), Suppl. 21.