Total performance of Nikon EB stepper R&D tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 468-477

  Fujiwara, Tomoharu ^a   Hirayanagi, Noriyuki ^a   Udagawa, Jin ^a   Ikeda, Junji ^a   Shimizu, Sumito ^a   Takekoshi, Hidekazu ^a   Suzuki, Kazuaki ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Contact hole; Electron beam; Electron Projection Lithography; EPL; Subfield stitching

Indexed keywords

ABERRATIONS; DEFLECTION (STRUCTURES); ELECTRON BEAMS; LIGHT SCATTERING; OPTICAL RESOLVING POWER; RESEARCH AND DEVELOPMENT MANAGEMENT;

CONTACT HOLE; ELECTRON PROJECTION LITHOGRAPHY (EPL); SUBFIELD STITCHING;

PHOTOLITHOGRAPHY;

EID: 3843130635     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537008     Document Type: Conference Paper

References (13)

1. N. Hirayanagi et al., Proc. SPIE 5037, 504 (2003).
2. S. D. Berger and J. M. Gibson, Appl. Phys. Lett. 57, 153 (1990).
3. H. C. Pfeiffer, Jpn. J. Appl. Phys., Part 1 34, 6658 (1995).
4. H. C. Pfeiffer et al., J. Vac. Sci. Technol. B 17, 2840 (1990).
5. K. Suzuki et al., Proc. SPIE 3997, 214 (2000).
6. K. Suzuki, Proc. SPIE 4754, 775 (2002).
7. T. Miura, J. Vac. Sci. Technol. B 20, 2622 (2002).
8. M. Hamashima et al., Microelectron. Eng. 67-68. 109 (2003).
9. K. Suzuki et al., Proc. SPIE 2726, 767 (1996).
10. S. Kojima et al., J. Vac. Sci. Technol. B 18, 3017 (2000).
11. K. Suzuki et al., J. Vac. Sci. Technol. B 21, 2686 (2003).
12. T. Fujiwara et al., Proc. SPIE 4343, 727 (2001).
13. H. Yamamoto et al., Proc. SPIE 5037, 991 (2003).