First dynamic exposure results from an electron projection lithography tool

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2686-2690

  Suzuki, Kazuaki ^a   Fujiwara, Tomoharu ^a   Kojima, Shinichi ^a   Hirayanagi, Noriyuki ^a   Yahiro, Takehisa ^a   Udagawa, Jin ^a   Shimizu, Sumito ^a   Yamamoto, Hajime ^a   Suzuki, Motoko ^a   Takekoshi, Hidekazu ^a   Fukui, Saori ^a   Hamashima, Muneki ^a   Ikeda, Junji ^a   Okino, Teruaki ^a   Shimizu, Hiroyasu ^a   Takahashi, Shinichi ^a   Yamada, Atsushi ^a   Umemoto, Takaaki ^a   Katagiri, Satoshi ^a   Ohkubo, Yukiharu ^a   Shimoda, Toshimasa ^a   Hirose, Keiichi ^a   Tanida, Toru ^a   Watanabe, Yoichi ^a   Kaminaga, Takeshi ^a   Kohama, Yoshiaki ^a   Mori, Futoshi ^a   Takemoto, Shigeru ^a   Yoshioka, Takeshi ^a   Hirose, Hiroshi ^a   Morita, Kenji ^a   Hada, Kazunari ^a   Kawata, Shintaro ^a   Sato, Tatsuo ^a   Sato, Yu ^a   Tokunaga, Masateru ^a   Okamoto, Kazuya ^a   Kakizaki, Yukio ^a   Miura, Takaharu ^a   more..

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRON BEAMS; ELECTRON OPTICS; IMAGE SENSORS; INTERFEROMETERS; MASKS; OPTICAL FILTERS; OPTICAL SENSORS;

ELECTRON BEAM SIGNALS; ELECTRON PROJECTION LITHOGRAPHY (EPL);

ELECTRON BEAM LITHOGRAPHY;

EID: 0942300068     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.162928710.1116/1.1629287     Document Type: Article

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