Hydrogen-sensitive amorphous ferroelectric thin film capacitive devices

Integrated Ferroelectrics

Volumn 44, Issue , 2002, Pages 25-75

  Zhu, W ^a   Chen, X F ^a   Tan, O K ^a   Deng, J ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Amorphous; Ferroelectric thin film; Hydrogen gas sensor

Indexed keywords

ANNEALING; CAPACITORS; CHEMICAL SENSORS; FORMING; HETEROJUNCTIONS; INTERFACES (MATERIALS);

FORMING GAS ANNEALING (FGA); HYDROGEN GAS SENSORS; HYDROGEN KINETIC PROCESSES; HYDROGEN SENSITIVITY;

FERROELECTRIC THIN FILMS;

EID: 19744368782     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580215144     Document Type: Article

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