Kinetic modelling of the H2-O2 reaction on Pd and of its influence on the hydrogen response of a hydrogen sensitive Pd metal-oxide-semiconductor device

Surface Science

Volumn 350, Issue 1-3, 1996, Pages 91-102

  Fogelberg, Joakim ^a   Petersson, Lars Gunnar ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

Author keywords

Catalysis; Hydrogen; Models of surface kinetics; Oxygen; Palladium; Photoelectron spectroscopy; Surface chemical reaction; Work function measurements

Indexed keywords

ABSORPTION; ADSORPTION; CATALYSIS; INTERFACES (MATERIALS); MATHEMATICAL MODELS; MOS DEVICES; OXYGEN; PALLADIUM; PHOTOELECTRON SPECTROSCOPY; REACTION KINETICS; SURFACE PHENOMENA; SURFACES;

HYDROGEN DISSOCIATION SITES; HYDROGEN SENSITIVE DEVICES; STERIC OXYGEN BLOCKING; WORK FUNCTION MEASUREMENTS;

HYDROGEN;

EID: 0030127549     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)80059-8     Document Type: Article

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