Effect of the nanoparticles on the structure and crystallization of amorphous silicon thin films produced by rf glow discharge

Journal of Materials Research

Volumn 13, Issue 9, 1998, Pages 2476-2479

  Bertran, E ^a   Sharma, S N ^a   Viera, G ^a   Costa, J ^b   St'ahel, P ^c   Roca I Cabarrocas, P ^c  

^a UNIVERSITY OF BARCELONA   (Spain)

^b UNIVERSITY OF GIRONA   (Spain)

^c LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTALLIZATION; ELECTRIC VARIABLES MEASUREMENT; GLOW DISCHARGES; HYDROGENATION; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CONTINUOUS WAVE PLASMA;

AMORPHOUS SILICON;

EID: 0032166588     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1998.0347     Document Type: Article

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