Structural characterization and crystallization process of nanostructured silicon thin films produced in low-pressure silane plasma

Materials Research Society Symposium - Proceedings

Volumn 507, Issue , 1999, Pages 933-938

  Viera, G ^a   Roca i Cabarrocas, P ^a   Costa, J ^a   Martinez, S ^a   Bertran, E ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION; FILM GROWTH; NANOSTRUCTURED MATERIALS; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON; SILANES; X RAY CRYSTALLOGRAPHY;

SILICON-ORDERED PARTICLES;

SEMICONDUCTING FILMS;

EID: 0032663609     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)