Electrical characterization and modeling of a dust forming plasma in a radio frequency discharge

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 2, 1996, Pages 572-576

  Boufendi, L ^a   Bouchoule, A ^a   Hbid, T ^b  

^a UNIVERSITÉ D'ORLÉANS   (France)

^b UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030530190     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580147     Document Type: Article

References (19)

1. G. S. Selwyn, J. Singh, and R. S. Bennett, J. Vac. Sci. Technol. A7, 2758 (1989).
2. W. Stoffels, E. Stoffels, and G. Kroesen, Plasma Sources Sci. Technol. 3, 320 (1994)
3. G. M. Jellum and D. B. Graves, Appl. Phys. Lett. 57, 2077 (1990); A. Garscadden, B. N. Ganguly, P. D. Haaland, and J. Williams. Plasma Sources Sci. Technol. 3, 239 (1994).
4. G. M. Jellum and D. B. Graves, Appl. Phys. Lett. 57, 2077 (1990); A. Garscadden, B. N. Ganguly, P. D. Haaland, and J. Williams. Plasma Sources Sci. Technol. 3, 239 (1994).
5. H. M. Anderson, R. Jairath, and L. Mock, J. Appl. Phys. 67, 3999 (1990).
6. L. Boufendi, A. Plain, J. Ph. Blondeau, C. Laure, and A. Bouchoule, Appl. Phys. Lett. 60, 169 (1992).
7. L. Boufendi, A. Bouchoule, R. K. Porteous, J. Ph. Blondeau, A. Pain, and C. Laure, J. Appl. Phys. 73, 2160 (1993).
8. L. Boufendi, J. Hermann, A. Bouchoule, B. Dubreuil, E. Stoffels, W. Stoffels, and M. L. de Giorgi, J. Appl. Phys. 76, 148 (1994).
9. A. A. Howling, Ch. Hollenstein, and P. J. Paris, Appl. Phys. Lett. 59, 1409 (1991); Ch. Hollenstein, J. L. Dorier, J. Dutta, L. Sansonnens, and A. A. Howling Plasma Sources Sci. Technol. 3, 278 (1994).
10. A. A. Howling, Ch. Hollenstein, and P. J. Paris, Appl. Phys. Lett. 59, 1409 (1991); Ch. Hollenstein, J. L. Dorier, J. Dutta, L. Sansonnens, and A. A. Howling Plasma Sources Sci. Technol. 3, 278 (1994).
11. See, for example, J. P. Boeuf, Phys. Rev. A 46, 7910 (1992); Ph. Belenguer, J. Ph. Blondeau, L. Boufendi, M. Toogood, A. Plain, and C. Laure, Phys Rev. A 46, 7923 (1992); T. J. Sommerer, M. S. Barnes, J. H. Keller, M. J. McCaughey, and M. J. Kushner, Appl. Phys. Lett. 59, 638 (1991); J. E. Daugherty, R. K. Porteous, M. D. Kilgore, D. B. Graves, S. J. Choi, and M. J. Kushner, J. Appl. Phys. 74, 853 (1993); J. Goree, Phys. Rev. Lett. 69, 277 (1992);
12. See, for example, J. P. Boeuf, Phys. Rev. A 46, 7910 (1992); Ph. Belenguer, J. Ph. Blondeau, L. Boufendi, M. Toogood, A. Plain, and C. Laure, Phys Rev. A 46, 7923 (1992); T. J. Sommerer, M. S. Barnes, J. H. Keller, M. J. McCaughey, and M. J. Kushner, Appl. Phys. Lett. 59, 638 (1991); J. E. Daugherty, R. K. Porteous, M. D. Kilgore, D. B. Graves, S. J. Choi, and M. J. Kushner, J. Appl. Phys. 74, 853 (1993); J. Goree, Phys. Rev. Lett. 69, 277 (1992);
13. See, for example, J. P. Boeuf, Phys. Rev. A 46, 7910 (1992); Ph. Belenguer, J. Ph. Blondeau, L. Boufendi, M. Toogood, A. Plain, and C. Laure, Phys Rev. A 46, 7923 (1992); T. J. Sommerer, M. S. Barnes, J. H. Keller, M. J. McCaughey, and M. J. Kushner, Appl. Phys. Lett. 59, 638 (1991); J. E. Daugherty, R. K. Porteous, M. D. Kilgore, D. B. Graves, S. J. Choi, and M. J. Kushner, J. Appl. Phys. 74, 853 (1993); J. Goree, Phys. Rev. Lett. 69, 277 (1992);
14. See, for example, J. P. Boeuf, Phys. Rev. A 46, 7910 (1992); Ph. Belenguer, J. Ph. Blondeau, L. Boufendi, M. Toogood, A. Plain, and C. Laure, Phys Rev. A 46, 7923 (1992); T. J. Sommerer, M. S. Barnes, J. H. Keller, M. J. McCaughey, and M. J. Kushner, Appl. Phys. Lett. 59, 638 (1991); J. E. Daugherty, R. K. Porteous, M. D. Kilgore, D. B. Graves, S. J. Choi, and M. J. Kushner, J. Appl. Phys. 74, 853 (1993); J. Goree, Phys. Rev. Lett. 69, 277 (1992);
15. See, for example, J. P. Boeuf, Phys. Rev. A 46, 7910 (1992); Ph. Belenguer, J. Ph. Blondeau, L. Boufendi, M. Toogood, A. Plain, and C. Laure, Phys Rev. A 46, 7923 (1992); T. J. Sommerer, M. S. Barnes, J. H. Keller, M. J. McCaughey, and M. J. Kushner, Appl. Phys. Lett. 59, 638 (1991); J. E. Daugherty, R. K. Porteous, M. D. Kilgore, D. B. Graves, S. J. Choi, and M. J. Kushner, J. Appl. Phys. 74, 853 (1993); J. Goree, Phys. Rev. Lett. 69, 277 (1992);
16. J. Goree, Plasma Sources Sci. Technol. 3, 400 (1994).
17. A. Bouchoule, A. Plain, L. Boufendi, J. Ph. Blondeau, and C. Laure, J. Appl. Phys. 70, 1991 (1991).
18. R. K. Porteous (private communication).
19. A. A. Fridman, L. Boufendi, T. Hbid, B. Potapkin, and A. Bouchoule J. Appl. Phys. (to be published).