Characterization of polymer-like thin films deposited on silicon and glass substrates using PECVD method

Thin Solid Films

Volumn 447-448, Issue , 2004, Pages 592-598

  Kim, M C ^a   Cho, S H ^a   Lee, S B ^a   Kim, Y ^a   Boo, J H ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Leakage current density; Low dielectric constant; PECVD; Polymer like thin film; Thiophene precursor

Indexed keywords

ACTIVATION ENERGY; DIFFUSION; FILM GROWTH; GLASS; IGNITION; ORGANOMETALLICS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; POLYMERS; SILICON; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

LEAKAGE CURRENT DENSITY; LOW DIELECTRIC CONSTANT; POLYMER-LIKE THIN FILMS; THIOPHENE PRECURSORS;

THIN FILMS;

EID: 1342344850     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.07.021     Document Type: Conference Paper

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