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Volumn 45, Issue 3, 1998, Pages 620-625

Technology for advanced high-performance microprocessors

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CMOS INTEGRATED CIRCUITS; MOSFET DEVICES; RANDOM ACCESS STORAGE; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032028642     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.661223     Document Type: Article
Times cited : (109)

References (7)
  • 3
    • 0028744093 scopus 로고    scopus 로고
    • Characteristics of CMOS device isolation for the ULSI age, 1994, pp. 671-674.
    • A. Bryant W. Mansch, and T. Mii, "Characteristics of CMOS device isolation for the ULSI age," in IEDM Tech. Dig., 1994, pp. 671-674.
    • IEDM Tech. Dig.
    • Bryant, A.1    Mansch, W.2    Mii, T.3
  • 4
    • 0030647286 scopus 로고    scopus 로고
    • Dual threshold voltages and substrate bias: Keys to high-performance, low-power, 0.1ftm logic designs, 1997, pp. 69-70.
    • S. Thompson, I. Young, J. Greason, and M. Bohr, "Dual threshold voltages and substrate bias: Keys to high-performance, low-power, 0.1ftm logic designs," in Symp. VLSI Technol. Dig., 1997, pp. 69-70.
    • Symp. VLSI Technol. Dig.
    • Thompson, S.1    Young, I.2    Greason, J.3    Bohr, M.4
  • 5
    • 0029322021 scopus 로고    scopus 로고
    • MOS transistors: scaling and performance trends, vol. 18, no. 6, pp. 75-80, 1995.
    • M. Bohr, "MOS transistors: scaling and performance trends,"Semiconduct. Int., vol. 18, no. 6, pp. 75-80, 1995.
    • Semiconduct. Int.
    • Bohr, M.1
  • 6
    • 0029547914 scopus 로고    scopus 로고
    • Interconnect scaling-The real limiter to high-performance ULSI, 1995, pp. 241-244.
    • _, "Interconnect scaling-The real limiter to high-performance ULSI," in IEDM Tech. Dig., 1995, pp. 241-244.
    • IEDM Tech. Dig.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.