Measurements of atomic carbon density in processing plasmas by vacuum ultraviolet laser absorption spectroscopy

Journal of Applied Physics

Volumn 92, Issue 10, 2002, Pages 5684-5690

  Tanaka, Norifusa ^a   Tachibana, Kunihide ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSOLUTE DENSITY; ATOMIC CARBON; ATOMIC SPECIES; C ATOMS; DENSITY VALUE; ICP SOURCE; LASER ABSORPTION SPECTROSCOPY; LOSS RATES; MIXING TECHNIQUES; NO ABSORPTION; OPERATING CONDITION; PROCESSING PLASMA; RESONANCE LINE; SOURCE GAS; TWO-PHOTON RESONANCE; VACUUM ULTRAVIOLETS; VUV LASERS; WAVELENGTH RANGES;

INDUCTIVELY COUPLED PLASMA; PLASMA SOURCES; ULTRAVIOLET LASERS; VACUUM; XENON;

ATOMS;

EID: 0037112971     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1513877     Document Type: Article

References (30)

1. S. Den, T. Kuno, M. Ito, M. Hori, J. Vac. Sci. Technol. A 15, 2880 (1997). jva JVTAD6 0734-2101
2. M. E. Coltrin and D. S. Dandy, J. Appl. Phys. 74, 5803 (1993). jap JAPIAU 0021-8979
3. B. W. Yu and S. L. Girshick, J. Appl. Phys. 75, 3914 (1994). jap JAPIAU 0021-8979
4. K. Teii, H. Ito, M. Hori, T. Takeo, T. Goto, J. Appl. Phys. 87, 4572 (2000). jap JAPIAU 0021-8979
5. M. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharge and Materials Processing (Wiley, New York, 1994).
6. K. Miyata, M. Hori, T. Goto, J. Vac. Sci. Technol. A 14, 2343 (1996). jva JVTAD6 0734-2101
7. P. Das, G. S. Ondrey, N. van Veen, R. Bersohn, J. Chem. Phys. 79, 724 (1983). jcp JCPSA6 0021-9606
8. G. C. Herring, M. J. Dyer, L. E. Jusinsky, W. K. Bischel, Opt. Lett. 13, 360 (1988). opl OPLEDP 0146-9592
9. D. Husain and L. J. Kirsch, Trans. Faraday Soc. 67, 2025 (1971). tfs TFSOA4 0014-7672
10. H. Ito, K. Teii, H. Funakoshi, M. Ito, T. Goto, J. Appl. Phys. 88, 4537 (2000). jap JAPIAU 0021-8979
11. A. Goehlich, T. Kawetzki, H. F. Doebele, J. Chem. Phys. 108, 9362 (1998). jcp JCPSA6 0021-9606
12. K. Tachibana and H. Kamisugi, Appl. Phys. Lett. 74, 2390 (1999). apl APPLAB 0003-6951
13. K. Tachibana, H. Kamisugi, T. Kawasaki, Jpn. J. Appl. Phys., Part 1 38, 4367 (1999). jjb JAPNDE 0021-4922
14. K. Tachibana, Plasma Sources Sci. Technol. 11, A166 (2002).
15. R. Hilbig and R. Wallenstein, IEEE J. Quantum Electron. QE-19, 194 (1983). ejq IEJQA7 0018-9197
16. H. F. Döebele, U. Czarnetzki, A. Goehlich, Plasma Sources Sci. Technol. 9, 477 (2000). pst PSTEEU 0963-0252
17. R. W. Falcone and J. Bokor, Opt. Lett. 8, 21 (1983). opl OPLEDP 0146-9592
18. W. L. Wiese and G. A. Martin, Wavelengths and Transition Probabilities for Atoms and Atomic Ions, NSRDS-NBS 68 (U.S. Government Printing Office, Washington, DC, 1980); see also http:physics.nist.gov/asd. The transition probabilities in the latter reference, which have been used in the present data analyses, are smaller than those in the former reference by 15%-20% for the relevant transitions.
19. H. Ito, M. Ikeda, M. Ito, M. Hori, T. Goto, Jpn. J. Appl. Phys., Part 2 36, L880 (1997). jjc JAPLD8 0021-4922
20. H. Ito, M. Ito, M. Hori, A. Kono, T. Goto, Jpn. J. Appl. Phys., Part 2 36, L1616 (1997). jjc JAPLD8 0021-4922
21. R. Rayling and P. Larkins, Optical Emission Lines of the Elements (Wiley, Chichester, 2000).
22. C. Suzuki, K. Sasaki, K. Kadota, Jpn. J. Appl. Phys., Part 1 38, 6896 (1999). jjb JAPNDE 0021-4922
23. A. I. Maksimov, L. S. Polak, A. F. Sergienko, D. I. Slovetskii, High Energy Chem. 13, 311 (1979). a4w HIECAP 0018-1439
24. T. G. Beuthe and J. S. Chang, Jpn. J. Appl. Phys., Part 1 36, 4997 (1997). jjb JAPNDE 0021-4922
25. A. R. Fairbaim, Proc. R. Soc. London, Ser. A 312, 207 (1969). prz PRLAAZ 0962-8444
26. F. F. Martinotti, M. J. Welch, A. P. Wolf, Chem. Commun. (London) 1968, 115 (1968) through NIST Chemical Kinetics Database No. 17 (1998). ccl CCOMA8 0009-241X
27. K. Takahashi, A. Itoh, T. Nakamura, K. Tachibana, Thin Solid Films 374, 303 (2000). tsf THSFAP 0040-6090
28. T. Kimura and K. Ohe, Plasma Sources Sci. Technol. 8, 553 (1999). pst PSTEEU 0963-0252
29. K. Tachibana, T. Mukai, A. Yuuki, Y. Matsui, H. Harima, Jpn. J. Appl. Phys., Part 1 29, 2156 (1990). jjb JAPNDE 0021-4922
30. J. M. Larson, M. T. Swihart, S. L. Girshick, Diamond Relat. Mater. 8, 1863 (1999). drm DRMTE3 0925-9635