Surface Roughness Study of Low-temperature PECVD a-Si:H

Materials Research Society Symposium - Proceedings

Volumn 762, Issue , 2003, Pages 595-600

  Dalakos, George T ^a   Plawsky, Joel L ^b   Persans, Peter D ^b  

^a GE GLOBAL RESEARCH   (United States)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DENSITY (SPECIFIC GRAVITY); DIFFUSION IN SOLIDS; ELLIPSOMETRY; GROUNDING ELECTRODES; INTERFACES (MATERIALS); ION BOMBARDMENT; LOW TEMPERATURE EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICON; SUBSTRATES; SURFACE ROUGHNESS;

OPTICAL INTERFACES; SURFACE HEIGHT MEASUREMENTS;

THIN FILMS;

EID: 1642438945     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-762-a5.14     Document Type: Conference Paper

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