Surface roughness evolution of PECVD cathodic and anodic a-Si:H

Materials Research Society Symposium - Proceedings

Volumn 715, Issue , 2002, Pages 37-42

  Dalakos, George T ^a   Plawsky, Joel L ^b   Persans, Peter D ^b  

^a GE GLOBAL RESEARCH   (United States)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRODES; HYDROGEN; ION BOMBARDMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STATISTICAL METHODS; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

POWER SPECTRAL DENSITY; SURFACE ROUGHNESS GROWTH;

AMORPHOUS SILICON;

EID: 0036909397     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-715-a19.4     Document Type: Conference Paper

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