Effects of the thermal annealing processes on praseodymium oxide based films grown on silicon substrates

Materials Science and Engineering: B

Volumn 118, Issue 1-3, 2005, Pages 192-196

  Nigro, Raffaella Lo ^a   Toro, Roberta G ^b   Malandrino, Graziella ^b   Raineri, Vito ^a   Fragalà, Ignazio L ^b  

^a CNR   (Italy)

^b UNIVERSITY OF CATANIA   (Italy)

Author keywords

Dielectric; High k; MOCVD; Praseodymium oxide; Thermal stability

Indexed keywords

ANNEALING; ARGON; CMOS INTEGRATED CIRCUITS; CRYSTALLIZATION; DIELECTRIC MATERIALS; ELECTRON DIFFRACTION; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PRASEODYMIUM COMPOUNDS; SILICON; STOICHIOMETRY; THERMAL EFFECTS; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY;

HIGH K; PRASEODYMIUM OXIDE; SILICON SUBSTRATES; THERMAL ANNEALING;

THIN FILMS;

EID: 15344347365     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.12.027     Document Type: Conference Paper

References (23)

1. D.A. Muller, T. Sorsch, S. Moccio, F.H. Baumann, and G. Timp Nature 399 1999 758
2. G.D. Wilk, R.M. Wallace, and J.M. Anthony J. Appl. Phys. 89 2001 5243
3. S. Guha, E. Cartier, M.A. Gribelyuk, N.A. Bojarczuk, and M.C. Copel Appl. Phys. Lett. 77 2000 2710
4. J. Kwo, M. Hong, A.R. Koetan, K.T. Queeney, Y.J. Chabal, J.P. Mannaerts, T. Boone, J.J. Krajewski, A.M. Segent, and J.M. Rosamilia Appl. Phys. Lett. 77 2000 130
5. H.J. Osten, J.P. Liu, and H.J. Mussig Appl. Phys. Lett. 80 2002 297
6. J. Robertson J. Vac. Sci. Technol. B 18 2000 1785
7. P.S. Lysaght, P.J. Chen, R. Bergmann, T. Messina, R.W. Murto, and H.R. Huff J. Non-Cryst. Solids 304 2002 54
8. G.D. Wilk, and R.M. Wallace Appl. Phys. Lett. 74 1999 2854
9. G.D. Wilk, R.M. Wallace, and J.M. Anthony J. Appl. Phys. 87 2000 484
10. B.C. Hendrix, A.S. Borovik, C. Xu, J.F. Roeder, T.H.J. Bevan, M.R. Visokay, J.J. Chambers, A.L.P. Rotondaro, H. Bu, and L. Colombo Appl. Phys. Lett. 80 2002 2362
11. T. Kodas, and M. Hampden-Smith The Chemistry of Metal CVD 1994 Wiley-VCH Weinheim, Germany
12. H.O. Pierson Handbook of Chemical Vapor Deposition 1992 Noesy New York
13. R. Lo Nigro, R. Toro, G. Malandrino, V. Raineri, and I.L. Fragalà Adv. Mater. 15 2003 1071
14. R. Lo Nigro, V. Raineri, C. Bongiorno, R. Toro, G. Malandrino, and I.L. Fragalà Appl. Phys. Lett. 83 2003 129
15. R. Lo Nigro, R. Toro, G. Malandrino, and I.L. Fragalà J. Electr. Soc. 151 2004 F206
16. R. Lo Nigro, R. Toro, G. Malandrino, G.G. Condorelli, V. Raineri, I.L. Fragalà, Adv. Funct. Mater. 15 (2005), in press.
17. D. Schmeisser, and H.J. Mussig Solid State Electron. 46 2003 1607
18. J.X. Wu, Z.M. Wang, F.Q. Li, and M.S. Ma Appl. Surf. Sci. 225 2004 229
19. H. Kim, and P.C. McIntyre J. Appl. Phys. 92 2002 5094
20. R.G.J. Ball, M.A. Mignanelli, T.I. Barry, and J.A. Gibsby J. Nucl. Mater. 201 1993 128
21. V.N. Parfenenkov, R.B. Grebenshchikov, and N.A. Toropov Dokl. Akad. Nauk. SSSR 185 1969 840
22. P. Lysaght, B. Foran, S. Stemmer, G. Bersuker, J. Bennett, R. Tichy, L. Larson, and H.R. Huff Microelectr. Eng. 69 2003 182
23. S.-K. Kang, D.-H. Ko, E.-H. Kim, M.H. Cho, and C.N. Wang Thin Solid Films 353 1999 8