Property of hexafluoroacetylacetonateCu(I) (3,3-dimethyl-1-butene) as a liquid precursor for chemical vapor deposition of copper films

Electrochemical and Solid-State Letters

Volumn 3, Issue 3, 2000, Pages 135-137

  Rhee, Shi Woo ^a   Kang, Sang Woo ^a   Han, Sang Ho ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Nano Tera Materials Incorporated   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BAND STRUCTURE; CHEMICAL VAPOR DEPOSITION; COPPER; ELECTRIC CONDUCTIVITY; ELECTRONIC DENSITY OF STATES; LIQUID METALS; PRESSURE MEASUREMENT; THERMAL EFFECTS; THERMOANALYSIS; THIN FILMS;

HEXAFLUOROACETYLACETONATE COPPER VINYLTRIMETHYSILANE; ORGANOMETALLICS PRECURSOR;

ORGANOMETALLICS;

EID: 0034159254     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390980     Document Type: Article

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