Lateral growth of focused ion beam deposited platinum for stencil mask repair

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3154-3157

  DeMarco, Anthony J ^a   Melngailis, John ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033267624     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590971     Document Type: Article

References (7)

1. R. Kaesmaier, Electron, Ion, and Photon Beam and Nanostructures Conference, Marco Island, FL, June 1999
2. [for a summary of earlier work see J. Melngailis, A. A. Mondelli, I. L. Berry, and R. Mohondro, J. Vac. Sci. Technol. B 16, 927 (1998)].
3. J. Melngailis, Proc. SPIE 1465, 36 (1991).
4. U. F. W. Behringer, P. Vettiger, R. Speidel, and G. Benner, Microcircuit Engineering Conference 84 (Academic, New York, 1985), p. 93.
5. K. T. Kohlmann, L. M. Buchmann, and W. H. Brunger, Microelectron. Eng. 17, 427 (1992).
6. L. R. Harriott, AT&T Bell Labs (private communication).
7. T. Tao, W. Wilkinson, and J. Melngailis, J. Vac. Sci. Technol. B 9, 162 (1991).