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Volumn 14, Issue 2, 2004, Pages 235-241

The BELST II process for a silicon high-aspect-ratio micromaching vertical comb actuator and its applications

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL ATTENUATORS; VERTICAL COMB ACTUATORS (VCA);

EID: 1242287809     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/14/2/010     Document Type: Article
Times cited : (22)

References (25)
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  • 2
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    • Lin L Y and Goldstein E L 1999 Micro-electro-mechanical systems (MEMS) for WDM optical-crossconnect networks MILCOM 1999 (Atlantic City, NJ, Oct. 1999) vol 2 pp 954-7
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  • 3
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    • Surface-micromachined electrostatic-comb driven scanning micromirrors for barcode scanners
    • Kiang M, Solgaard O, Muller R S and Lau K Y 1996 Surface-micromachined electrostatic-comb driven scanning micromirrors for barcode scanners MEMS'96 (San Diego, CA, Feb. 1996) pp 192-7
    • (1996) MEMS'96 (San Diego, CA, Feb. 1996) , pp. 192-197
    • Kiang, M.1    Solgaard, O.2    Muller, R.S.3    Lau, K.Y.4
  • 5
    • 0033338025 scopus 로고    scopus 로고
    • Integrated polysilicon and DRIE bulk silicon micromachining for an electrostatic torsional actuator
    • Yeh J A, Jiang H and Tien N C 1999 Integrated polysilicon and DRIE bulk silicon micromachining for an electrostatic torsional actuator J. Microelectromech. Syst. 8 456-65
    • (1999) J. Microelectromech. Syst. , vol.8 , pp. 456-465
    • Yeh, J.A.1    Jiang, H.2    Tien, N.C.3
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    • Kim J, Park S and Cho D 2001 A novel electrostatic vertical actuator fabricated in one homogeneous silicon wafer using extended SBM technology Transducers'01 (Munich, June 2001) vol 1 pp 756-9
    • (2001) Transducers'01 (Munich, June 2001) , vol.1 , pp. 756-759
    • Kim, J.1    Park, S.2    Cho, D.3
  • 8
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    • SCREAM I: A single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures
    • Shaw K A, Chang Z L and MacDonald N C 1994 SCREAM I: a single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures Sensors Actuators A 40 210-3
    • (1994) Sensors Actuators A , vol.40 , pp. 210-213
    • Shaw, K.A.1    Chang, Z.L.2    MacDonald, N.C.3
  • 10
    • 0026881397 scopus 로고
    • A bulk silicon dissolved wafer process for microelectromechanical devices
    • Gianchandani Y and Najafi K 1992 A bulk silicon dissolved wafer process for microelectromechanical devices J. Microelectromech. Syst. 1 77-85
    • (1992) J. Microelectromech. Syst. , vol.1 , pp. 77-85
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.