Localized defects in multilayer coatings

Thin Solid Films

Volumn 446, Issue 1, 2004, Pages 37-49

  Stearns, D G ^a   Mirkarimi, P B ^b   Spiller, E ^c  

^a OS Associates   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^c Spiller X ray Optics   (United States)

Author keywords

Localized defects; Mo Si multilayer coating; Non linear continuum model

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; CONTINUUM MECHANICS; DEFECTS; FILM GROWTH; ION BEAMS; LITHOGRAPHY; METALLIC FILMS; NUCLEATION; OPTICAL COATINGS; PARTICLE SIZE ANALYSIS; REACTIVE ION ETCHING; SUBSTRATES; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION; X RAY FILMS;

DEFECT-FREE MASKS; LOCALIZED DEFECTS; MULTILAYER COATINGS; SHADOWING EFFECTS;

MULTILAYERS;

EID: 0346781555     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01285-9     Document Type: Article

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