Transmission electron microscopy observation and simulation analysis of defect-smoothing effect of molybdenum/silicon multilayer coating for extreme ultraviolet lithography masks

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 4, 2002, Pages 2285-2288

  Ogawa, Taro ^a,b   Ito, Masaaki ^a   Takahashi, Masashi ^a   Hoko, Hiromasa ^a   Yamanashi, Hiromasa ^a   Hoshino, Eiichi ^a   Okazaki, Shinji ^a   Sekine, Keiichi ^a   Kataoka, Izumi ^a  

^a NTT CORPORATION   (Japan)

^b Japan Aviat Electron Indust   (Japan)

Author keywords

Extreme ultraviolet lithography (EUVL); Mask, multilayer; Molybdenum silicon (Mo Si); Phase defect; Resputtering; Simulation; Smoothing

Indexed keywords

ARGON; COATINGS; COMPUTER SIMULATION; DEFECTS; LIGHT REFLECTION; MASKS; MOLYBDENUM; PHOTOLITHOGRAPHY; SILICA; SILICON; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

BUMPS; DEFECT SMOOTHING EFFECT; DIVOTS; EXTREME ULTRAVIOLET LITHOGRAPHY;

MULTILAYERS;

EID: 0036529319     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.2285     Document Type: Article

References (8)