Scattering from normal incidence EUV optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 72-80

  Gullikson, E M ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

EUV lithography; Optical testing; Roughness; Scattering; Surface profile

Indexed keywords

ATOMIC FORCE MICROSCOPY; IMAGING SYSTEMS; LIGHT SCATTERING; OPTICAL MICROSCOPY; OPTICAL TESTING; PROFILOMETRY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) OPTICS;

PHOTOLITHOGRAPHY;

EID: 0032404134     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309625     Document Type: Conference Paper

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