Carbonate formation during post-deposition ambient exposure of high-k dielectrics

Applied Physics Letters

Volumn 83, Issue 17, 2003, Pages 3543-3545

  Gougousi, Theodosia ^a   Niu, Dong ^a   Ashcraft, Robert W ^a   Parsons, Gregory N ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBONATES; DEPOSITION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); PERMITTIVITY; RAPID THERMAL ANNEALING; THICK FILMS;

POST-EXPOSURE ANNEALING;

DIELECTRIC MATERIALS;

EID: 0242582877     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1623316     Document Type: Article

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