Spatial emission characteristics of EUV plasma sources

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 656-669

  Mann, K ^a   Kranzusch, S ^a   Peth, C ^a   Schurmann M C ^b   Missalla T ^b  

^a LASER LABORATORIUM GÖTTINGEN E V   (Germany)

^b Jenoptik Mikrotechnik   (Germany)

Author keywords

13 nm radiation; Absorptance of EUV radiation; EUV; Gas puff target; Laser induced plasma; LIF; Pinhole camera

Indexed keywords

ALGORITHMS; CAMERAS; JETS; LASER PRODUCED PLASMAS; LASER PULSES; LIGHT EMISSION; NOZZLES; OPTICS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; EXTREME ULTRAVIOLET PLASMA SOURCE; GAS PUFF TARGET; OXYGEN GAS JET; PINHOLE CAMERA; SOFT X RAY EMISSION;

PLASMA SOURCES;

EID: 0141612982     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482748     Document Type: Conference Paper

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